The energy flow in the course of thermal processing and during formation of thin films
Jacek Rońda1, Ryszard Pęcherski2, Bogusław Rajchel3
1Wydział Inżynierii Metali i Informatyki Przemysłowej, Akademia Górniczo-Hutnicza, al. Mickiewicza 30, 30-059 Kraków.
2Instytut Mechaniki Budowli, Wydział Inżynierii Lądowej, Politechnika Krakowska, ul. Warszawska.
3Instytut Fizyki Jądrowej Polskiej Akademii Nauk im. H. Niewodniczańskiego, ul. Radzikowskiego 152, 31-342 Kraków.
DOI:
https://doi.org/10.7494/cmms.2005.4.0082
Abstract:
Introduction to the modelling of the energy flow from electrodes through ionized gas to a heat affected zone (HAZ) during thermal processing and welding as well as the Ion Beam Assisted Deposition technique applied to formation of thin films is presented in this paper. A multiscale approach to the description of the problem is studied afresh. In particular, the multiscale deterministic model of the phenomenon of the transmission of energy in plasma processes and numerical simulation of the interaction with the surface of two ion beams: of low and high energy, which is typical for the IBAD technique are considered. Some problems related with numerical modelling of plasma-liquid metal interaction are also discussed.
Cite as:
Rońda, J., Pęcherski, R., & Rajchel, B. (2005). The energy flow in the course of thermal processing and during formation of thin films. Computer Methods in Materials Science, 5(4), 179 – 184. https://doi.org/10.7494/cmms.2005.4.0082
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