Bi-velocity reactive mass transport phenomenology. Modeling of CVD process

Bartek Wierzba

Interdisciplinary Centre for Materials Modelling, FMSci&C, AGH University of Science,and Technology, Al. Mickiewicza 30, 30-059 Kraków, Poland.

DOI:

https://doi.org/10.7494/cmms.2011.2.0355

Abstract:

This paper presents a numerical method to determine the concentration profile during the aluminization process. The quantitative description of the diffusion controlled Chemical Vapor Deposition (CVD) of the coating formation is shown. The method is based on volume fixed frame of reference. It allows computing the material velocity in the reacting system in which reactions at several moving interfaces occur. All reactions lead to the lattice shift due to the difference of intrinsic diffusivities and different molar volumes. It is shown that the derived set of partial differential equations describing the reactive diffusion is thermodynamically consistent and can be used in advanced modeling.

Cite as:

Wierzba, B. (2011). Bi-velocity reactive mass transport phenomenology. Modeling of CVD process. Computer Methods in Materials Science, 11(2), 364 – 368. https://doi.org/10.7494/cmms.2011.2.0355

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