On prognosis of variation of properties of epitaxial layers by choosing of temperature field during growth
1Nizhny Novgorod State University, 23 Gagarin avenue, Nizhny Novgorod, 603950, Russia.
2Nizhny Novgorod State Technical University, 24 Minin Street, Nizhny Novgorod, 603950, Russia.
DOI:
https://doi.org/10.7494/cmms.2020.1.0648
Abstract:
In this paper, we analyze the influence of the temperature of growth of epitaxial layers during their growth. Conditions are formulated under which the homogeneity of the properties of the epitaxial layers increases. An analytical approach for the analysis of mass and heat transfer is proposed, allowing at the same time to take into account changes in the parameters of processes both in space and in time, as well as nonlinearity of these processes.
Cite as:
Pankratov, E.L. (2020). On prognosis of variation of properties of epitaxial layers by choosing of temperature field during growth. Computer Methods in Materials Science,20, 1-6. https://doi.org/10.7494/cmms.2020.1.0648
Article (PDF):
Keywords:
Epitaxial growth, Properties of epitaxial layers, Homogeneity of properties
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